Nghiên cứu chế tạo màng gương nóng truyền qua bằng phương pháp phún xạ magnetron dc

147 TÀI LIỆU THAM KHẢO Tiếng Việt: 1 Cao Thị Mỹ Dung (2006), Chế tạo màng dẫn điện trong suốt ZnO-Ga bằng phương phỏp phỳn xạ Magnetron, Luận văn cao học, ĐH Khoa học Tự nhiờn TPHCM, GVHD GS. Nguyễn Hửu Chớ. 2 Đào Vĩnh Ái (2004), Hoàn thiện quy trỡnh chế tạo màng ZnO:Al và ứng dụng cho mỏy chưng cất nước bằng năng lượng mặt trời, Luận văn cao học, ĐH Khoa học Tự nhiờn TPHCM, GVHD PGS. Trần Tuấn. 3 Hồ Văn Bỡnh (2004), Tạo màng gương núng truyền qua bằng phương phỏp phỳn xạ Magnetron DC cú diện tớch màng lớn, Luận văn cao học, ĐH Khoa học Tự nhiờn TPHCM, GVHD GS. Nguyễn Hửu Chớ. 4 Lờ Trấn, Nguyễn Duy Nhuận, Ngụ Hựng Cường, Nguyễn Hửu Chớ, Trần Tuấn, “Màng Gương Núng Truyền Qua Quang Xỳc Tỏc TiO2/TiN/TiO2” ,Hội Nghị Vật Lớ Chất Rắn Toàn Quốc Lần Thứ 5 - Vũng Tàu 12-14/11/2007. 5 Lờ Trấn, Nguyễn Hửu Chớ, Trần Tuấn, Hồ Văn Bỡnh (2004), “Nghiờn cứu chế tạo màng dẫn điện trong suốt ZnO:Al bằng phương phỏp phỳn xạ magnetron d.c”,Tạp chớ Phỏt triển Khoa học & Cụng nghệ ĐHQG - Tp.HCM Tập 7 (6), trang 11-15. 6 Lờ Trấn, Nguyễn Hửu Chớ, Trần Tuấn (2004), “Sự thành lập ion õm oxygen trong hệ phỳn xạ magnetron d.c với bia ZnO”, Tạp chớ Phỏt triển Khoa học & Cụng nghệ ĐHQG - Tp.HCM Tập 7 (1), trang 11-15. 7 Lờ Trấn, Trần Văn Phương, Trần Tuấn, Nguyễn Hửu Chớ (2008), “Nghiờn cứu chế tạo màng TiN bằng phương phỏp phỳn xạ phản ứng magnetron d.c”,Tạp chớ Phỏt triển Khoa học & Cụng nghệ ĐHQG - Tp.HCM Tập 11 (10), trang 51-59. 8 Lờ Văn Hiếu, Đào Vĩnh Ái, Hồ Văn Bỡnh, Nguyễn Hửu Chớ, Trần Tuấn (2005), “Hoàn thiện qui trỡnh tạo màng ZnO:Al với kớch thước lớn”, Tạp chớ Phỏt triển Khoa học & Cụng nghệ ĐHQG - Tp.HCM Tập 8 (3), trang 29-34. 148 9 Lờ Văn Hiếu, Đào Vĩnh Ái, Nguyễn Hửu Chớ, Trần Tuấn (2005), “Chế tạo mỏy chưng cất nước bằng năng lượng mặt trời với màng gương núng truyền qua ZnO:Al”, Tạp chớ Phỏt triển Khoa học & Cụng nghệ ĐHQG - Tp.HCM Tập 8 (4), trang 28-33. 10 Lờ Vũ Tuấn Hựng (2007), Nghiờn cứu chế tạo màng chống phản xạ trờn nền vật liệu TiO2 và SiO2, Luận ỏn tiến sĩ, ĐH Khoa học Tự nhiờn TPHCM, GVHD GS Nguyễn Văn Đến và PGS Huỳnh Thành Đạt. 11 Nguyễn Duy Nhuận (2008), màng gương núng truyền qua quang xỳc tỏc TiO2/TiN/TiO2, Khúa luận tốt nghiệp , ĐH Khoa học Tự nhiờn TPHCM, GVHD Lờ Trấn. 12 Nguyễn Hửu Chớ (2003), Điện động lực học, NXB Đại học Quốc gia Tp.HCM. 13 Nguyễn Minh Quang (2007), Nghiờn cứu tớnh chất quang và điện của màng TiN, Khúa luận tốt nghiệp , ĐH Khoa học Tự nhiờn TPHCM, GVHD Lờ Trấn. 14 Nguyễn Trung Thành (2008), màng gương núng truyền qua quang xỳc tỏc TiO2/Ag/TiO2, Khúa luận tốt nghiệp , ĐH Khoa học Tự nhiờn TPHCM, GVHD Lờ Trấn. 15 Vũ Thị Hạnh Thu (2005), “Pin mặt trời màng mỏng (ZnO:Al)/p-Si (111) tạo bằng phương phỏp phỳn xạ Magnetron DC”, Tạp chớ Phỏt triển Khoa học & Cụng nghệ ĐHQG - Tp.HCM Tập 8 (6), trang 5-10. 16 Vũ Thị Hạnh Thu, Nguyễn Hửu Chớ, Trần Tuấn, Văn Hồng Khụi, Nguyễn Chớ Tõm, Phạm Kim Ngọc (2007), Nghiờn cứu chế tạo màng quang xỳc tỏc TiO2 bằng phương phỏp phỳn xạ phản ứng magnetron d.c, Hội nghị Quang học Quang phổ Toàn quốc - lần IV, Cần Thơ, thỏng 8-2006 149 Tiếng Anh: 17 Ai Vinh Dao, Le Tran, Tran Tuan , Nguyen Huu Chi , Kyunghae Kim, Jaehyeong Lee, Sungwook Jung, N. Lakshminarayanand Junsin Yi (2008), “Electrical and optical studies of transparent conducting ZnO:Al thin films by magnetron dc”, J Electroceram 10.1007/s10832-008-9466-6. 18 Akira Fujishima, Tata N. Rao, Donald A.Tryk (2000), “Titanium dioxide photocatalysis”, Journal of Photochemistry and Photobiology C: Photochemistry Reviews 1, pages 1-21. 19 Angadi M. A. , Nallamshetty K. (1989), Journal Of Materials Science Letters 8, 391-394. 20 Armigliato A., Celotti G., Garulli A., Guerri S., Ostoja P., Rosa R. and Martinelli G. (1982), Thin Solid Films 92, 341. 21 Asamaki T., Hakumaku Sakusei No Kiso (1991), ed. Hujiyoshi T., The Nikkan Kogyo Shimbun, LTD, 2nd, ed., chapter 8, p.160. 22 Badeker K. (1907), Annals of Physics 22, 749. 23 Bogner G. (1961), The Physics and Chemistry of Solids 16, 235. 24 Buhl R., Pulker H. K., and Moll E. (1981), Thin Solid films 80, 265. 25 Bunshah F. and Deshpandey C. (1987), Physics of Thin Films Vol. 13, eds. Francombe M. H. and Vossen J. L., Academic Press, New York. 26 Burstein L. (1954), Physical Review 93, 632. 27 Carp O., HuismanC.L., RellerA. (2004), “Photoinduced Reactivity of titanium dioxide“, Progress in Solid State Chemistry 32, pp. 33-177. 28 Cebulla R., Wendt R., and Ellmer K. (1998), Journal of Applied Physics 83 (2), 1087-1095. 29 Chapman B. (1980), Glow Discharge Processes, John Wiley & Sons, New York. 30 Cheng C.C., Erdemir A., Fenske G.R. (1989), Surf. and Coat. Technol. 139/40, 365. 150 31 Cheng-Chung Lee (1996), “Optical Monitoring of Silver-based Transparent Heat Mirrors”, Applied Optics Vol.35, No.28, pages 5698-5703. 32 Choi B. H., Im H. B., Song J. S., and Yoon K. H. (1990), Thin Solid Films 193/194, 712-720. 33 Chopra K. L. and Das S. R. (1983), Thin Film Solar Cells, Plenum Press, New York, NY. 34 Chopra K. L., Major S., and Pandya D. K. (1983), Thin Solid Films 102, 1-46. 35 Chou W., Yu G., Huang J., (2000), Surf. and Coat. Technol. 140, 206. 36 Coutts T. J., Young D. L., and Li X. (2000), MRS Bulletin 25 (8), 58-65. 37 Craciun V., Elders J., Gardeniers J. G. E., Geretovsky J., and Boyd I. W. (1995), Thin Solid Films 259 (1), 1-4. 38 Cullity B. D. (1978), Elements of X-Ray Diffraction, Addision – Wesley Publishing Company, Inc., USA. 39 Cuomo J. J., Gambino R. J., Harper J. M. E., and Kuptsis J. D. (1977), IBM Journal of Research and Development 21, 580-583. 40 De Rooij A.(1989), ESA Journal Vol. 13, p. 366. 41 Del Re M., Gouttebaron R. (2004), Coatings Tech. 180-181, 488-495. 42 Del Re M., Dauchot J. P. and Hecq M. (2005), Surface and Coatings Technology Vol. 200, issues 1-4, 1 October, pages 94-99. 43 Demian S. E. (1994), Journal of Materials Science: Materials in Electronics 5 (1), 360-363. 44 Diana Mardare, Rusu G.I. (2002), “The influence of heat treatment on the optical properties of titanium oxide thin films”, Materials Letters 56, pp. 210-214. 45 Diebold U. (2003), Surface Science Reports, 48, 53-229. 46 Durrani S.M.A., Khawaja E.E, Al-Shukri A.M., Al-Kuhaili M.F. (2004), Energy and Buildings 36, 891-898. 47 Durusoy H.Z., Duyar O., Aydnl A. (2003), Ay F., Vacuum 70, 21. 151 48 Edward Palik (1985), HandBook of Optical Constant of Solid, Academic Press, Boston, USA. 49 Ehrenreich H. and Phillip H. R. (1962), Phys. Rev. 128, 1622. 50 Ellmer K. (2000), Journal of Physics D: Applied Physics 33 (4), 17-32. 51 Ellmer K., Kudella F., Mientus R., Schieck R., and Fiechter S. (1994), Thin Solid Films 247, 15-23. 52 Ellmer K., Kudella F., Mientus R., Schieck R., and Fiechter S. (1993), Applied Surface Science 70/71, 707-11. 53 Enoki H., Nakayama T., and Echigoya J. (1992), Physica Status Solidi A 129 (1), 181-191. 54 Eufinger K., Poelman D., Poelman H., De Gryse R., Marin G.B. (2007), Applied Surface Science. 55 FAN J.C.C and BACHNER F.J., (1976), “ibid”, 15, 1012. 56 Fark H., Chevallier J., Reichelt K., Dimigen H. and Hiibse H. (1983), Thin Solid Films 100, 193. 57 Gabrial, H. M. (1983), in T. Takagi (ed.) Proc. Int. Ion Engineering Congress, ISIDT Tokyo (Japan), 1311. 58 Gerlach J.W., Kraus T., Sienz S., Moske M., Zeitler M., and Rauschenbach B. (1998), Surface and Coating Tech. 103-104, 281. 59 Ginley D. S. and Bright C. (2000), MRS Bulletin 25 (8), 15-18. 60 Gordon R. G. (2000), MRS Bulletin 25 (8), 52-57. 61 Grove W. R. (1852), Philoshphical Transaction of the Royal Society 142 (78). 62 Hagen E and Rubens R. (1903), Ann. Phys. 11, 873. 63 Harper J. M. E., Cuomo J. J., Gambino R. J., Kaufman H. R., and Robinson R. S. (1978), Journal of Vacuum Science and Technology 15 (4), 1597-1600. 64 Hartnagel H. (1995), Semiconducting Transparent Thin Films, Institute of Physics Publications, Philadelphia, PA. 152 65 Hass G., Heaney J. B. , and Hunter W. R. (1982), Physics of Thin Films Vol. 12, eds. Hass G., Francombe M. H., and Vossen J. L., Academic Press, New York . 66 Hass G., Ritter E. (1967), J. Vac. Sci. Tech. 4, 71. 67 Hatscheck R. L., Mach A.M., (1983), Special Report No. 752, pp. 129. 68 Heavens O. S. (1991), Optical Properties of Thin Solid Films, Dover Publications, NewYork. 69 Hibbs M.K., Sundgren J.E., Jacobsson B. E. and Johansson B.O. (1983), Thin Solid Films 107, 149. 70 Hinze J., Ellmer K., (2000), J. applied physics 88, 2443-2450. 71 Holland L. and Siddall G. (1955), Vacuum III. 72 Hu J. and Glordon R. G. (1992), Journal of Applied Physics 72 (11), 5381-5392. 73 Hu J. and Glordon R.G. (1990), Solar Cells 30 (1-4), 437-450. 74 Hu J. and Glordon R.G. (1992), Journal of Applied Physics 71 (2), 880-890. 75 Hu J. and Glordon R.G. (1993), Proceedings of Fall Materials Research Society:Microcrystalline Semiconductors: Materials Science and Devices Symposium,Boston, MA. 76 Huang J.H., Lin C.H. (1999), Chen H., Materials Chemistry and Physics 59, 49. 77 Hummel R. E. (1993), Electronic Properties of Materials, Second ed. Springer- Verlag, Berlin. 78 Igasaki Y. and Mitsuhashi H. (1980), Thin Solid Filrns 70, 17. 79 Jọger S., Szyszka B., Szczyrbowski J., and Brọuer G. (1998), Surface and Coatings Technology 98 (1-3), 1304-1314. 80 Jang-Hoon Lee, Seung-Hyu Lee and Chang Kwon Hwangbo (2004), Journal of the Korean Physical Society Vol. 44, No. 3, March, pp. 750-756. 81 Jin Z.C., Hamberg I., and Granqvist C. G. (1988), Journal of Applied Physics 64, 5117-31 . 153 82 Johansson B.O., Sundgren J.E., Greene J. E., Rockett A. and Barnett S. A. (1985), J. Vac. Sci. Technol. A, 3, 303. 83 Kawasaki H., Ohshima T., Yagyu Y., Suda Y., Khartsev S. I., Grishin A. M. (2008), Journal of Physics: Conference Series 100, 012038. 84 Kawazoe H., Yanagi H., Ueda K., and Hosono H. (2000), MRS Bulletin 25 (8), 28-36. 85 Kester D. J. and Messier R. (1993), Journal of Materials Research 8 (8), 1928-1937. 86 Kester D. J. and Messier R. (1993), Journal of Materials Research 8 (8), 1938-1957. 87 Kim H., Piquộ A., Horwitz J.S., Murata H., Kafafi Z.H., Gilmore C.M., Chrisey D.B. (2000), Thin Solid Films 377-378, 798-802. 88 Kim J. S., Marzouk H. A., Reucroft P. J., and Hamrin Jr C. E., (1992), Thin Solid Films 217 (1), 133-137. 89 Kim N.Y., Son Y.B., Oh J.H., Hwangbo C.K., Park M.C. (2000), Surf. and Coat. Technol. 128-129, 156. 90 Kittel C. (1986), Introduction to Solid State Physics, John Wiley & Sons, Inc., NewYork. 91 Kluth O., Rech B., Houben L., Wieder S., Schửpe G., Beneking C., Wagner H., Lửffl A., and Schock H. W. (1998), Proceedings of the 2nd International Conference Coating Glass, Saarbỹcken, Germany. 92 Konishi R., Noda K., Harada H., and Sasakura H. (1992), Journal of Crystal Growth 117, 939-942. 93 Kửstlin H. And Frank G. (1982), Thin Solid Films 89, 287-293. 94 Lampert C.M. (1979), “Solar Energy Mater”, 1, 319. 95 Leng J.M., Chen J., Fanton J., Senko M., Ritz K., Opsal J. (1998), Thin Solid Films 313-314, 308. 96 Lewis B. G. and Paine D. C. (2000), MRS Bulletin 25 (8), 22-27. 154 97 Li S. S. (1993), Semiconductor Physcial Electronics, Plenum Press, New York. 98 Logothetidis S., Alexandrou I., Kokkou S. (1996), Surf. and Coat. Technol. 80, 66. 99 Lou H.Q., Axộn N., Somekh R.E., Hutchings I.M. (1997), Surface and Coatings Technology 90, 123-127. 100 Lytle W. O., (1951), Patent# 2,566,346, USA. 101 Maheo D., Poitevin J.M. (1992), Thin Solid Films, 215, 8. 102 Major S., Banerjee A., and Chopra K. L. (1984), Thin Solid Films 122, 31. 103 Maniv S., Miner C. J., and Westwood W. D. (1983), Journal of Vacuum Science and Technology A 1 (3), 1370-1375. 104 Martin D.C. and BELL R. (1960), “in Proceeding of Conference on Coatings for the Aerospace Environment”, Dayton, Ohio, WADD-TR-60-TB. 105 Martin-palma R.J. (1998), “Accurate determine of the optical constants of sputter-deposited Ag and SnO2 for low emissivity coating”, J.Vac.Sci.Technol. A Vol.16,No.2,mar/Apr,pages 409-412. 106 Masato Tazawa, Masahisa Okada, Kazuki Yoshimura, Shunjiro Ikezawa (2004), Solar Energy Materials & Solar Cells 84,159–170. 107 Matthews A. and Sundquist H.A. (1983), Proc. Int. Ion Engineering Congress, ISIAT 83 and IPAT 83, 1201. 108 Mattox D. M. (1963), J. Appl. Phys. 63, 2493. 109 Mattox, D. M. (1976)., “Optical Materials for Solar Energy Applications,” Optics News 3, 12. 110 Mauch R. H. and Schock H. W. (1991), Proceedings of the Tenth E.C. Photovoltaic Solar Energy Conference, Lisbon, Portugal. 111 Mayer J. W. and Lau S. S. (1990), Electronic Materials Science: For Integrated Circuits in Si and GaAs (Macmillan Publishing Company, New York. 155 112 McGraw J. M., Parilla P. A., Schulz D. L., Alleman J., Wu X., Mulligan W. P., Ginley D. S., and Coutts T. J. (1995), Proceedings of Spring Materials Research Society Conference: Film Synthesis and Growth Using Energetic Beams Symposium, San Francisco, CA. 113 McMaster H. A. (1947), Patent# 2,429,420, USA. 114 Meng L., Azevedo A., Santos M. P. (1995), Vacuum 46 (3), 233. 115 Menner R., Schọffler R., Sprecher B., and Dimmler B. (1998), Proceedings of the 2nd World Conference Exhibition on Photovoltaic Solar Energy Conference. 116 Minami T. (2000), MRS Bulletin 25 (8), 38-44. 117 Minami T., Nanto H., and Takata S. (1984)., Japanese Journal of Applied Physics Part 2:Letters 23, 280. 118 Minami T., Nanto H., and Takata S. (1982), Applied Physics Letters 40 (10), 961-3. 119 Minami T., Nanto H., Shooji S., and Takata S. (1984), Thin Solid Films 111 (2), 167-174. 120 Minami T., Oohashi K., Takata S., Mouri T., and Ogawa N. (1990), Thin Solid Films 193/194, 721-729. 121 Minami T., Sato H., Nanto H., and Takata S. (1985), Japanese Journal of Applied Physics 24 (10), 781-784. 122 Minami T., Sato H., Sonoda T., Nanto H., and Takata S. (1989), Thin Solid Films 171, 307-311. 123 Minami T., Sonohara H., Takata S., and Sato H. (1994), Japanese Journal of Applied Physics Part 2: Letters4 33, 1693. 124 Mitra P., Chatterjee A. P., and Maiti H. S. (1998), Materials Letters 35, 33-38. 125 Mochel J. M. (1947)., Patent# 2,564,706, USA. 126 Mochel J. M. (1951), Patent# 2,564,707, USA. 156 127 Mott N. F. (1990), Metal-insulator Transitions, 2nd ed. (Taylor & Francis, New York) 128 Musil J. (2000), Surface and Coating Tech. 125, 341. 129 Nakada T., Murakami N., and Kunioka A. (1994), Proceedings of the 12th European Photovoltaic Solar Energy Conference, Amsterdam, Netherlands.. 130 Nakamura K., Inagawa K., Tsuruoka K., and Komiya S. (1977), Thin Solid Films 40, 155. 131 Narayan J., Tiwari P., Singh J., Chowdhury R., and Zheleva T. (1992), Appl. Phys. Lett. 61, 1290. 132 Nelkel A., Freer R. (1990), The Physics and Chemistry of Carbides; Nitrides and Borides, Kluwer Academic Publishers, Netherlands, p.485. 133 Nokik A. J. and Haacke G. (1976), Patent# 3,957,029, USA. 134 Nozik A. J. (1974), Patent# 3,811,953, USA. 135 Ohring M. (1992), The Materials Science of Thin Films, Academic Press, Inc., London. 136 Park K. C., Ma D. Y. (1997), Thin Solid Films 305, 201-209. 137 Patsalas P., Charitidis C., Logothetidis S. (2000), Surf. and Coat. Technol., 125, 335. 138 Pecz B., Frangis N., Logothetidis S., Alexandrou I., Barna P.B. and Stoemenos J. (1995), Thin Solid Films 268, 57. 139 Pelizzetti E. and Minero C. (1993), “Mechanism of the photo-oxidative degradation of organic pollutants over TiO2 particles,” Journal Electrochimica Actica Vol. 38, pp. 47-55. 140 Pelleg Joshua, Zevin L.Z. and Lungo S. (1991), Thin Solid Films 197, 117. 141 Perry A. J. and Pulker H. P., (1985), Thin solid films 124, 323. 142 Petritz R. L. (1956), Physical Review 104 (6), 1508-16. 157 143 Poitevin J.M., Lemperiere G. and Tardy J. (1982) , Thin Solid Films 97, 69. 144 Prieto P. and Kirby R. E. (1995), J. Vac. Sci & Technol. A 13, 2819. 145 Pulker H. K. (1984), Coatings on Glass, Elsevier, New York. 146 Qiu S. N., Qiu C. X., and Shih I. (1987), Solar Energy Materials 15, 261-267 147 Reddy G.L.N., Ramana J.V., Sanjiv Kumar, Vikram Kumar S., Raju V.S. (2007), Applied Surface Science 253, 7230–7237. 148 Reddy G.L.N., Ramana J.V., Sanjiv Kumar, Vikram Kumar S., Raju V.S. (2007), Applied Surface Science 253, 7230–7237. 149 Reichrudel E. M., Smirnitskaya G.V., Nguyen Huu Chi (1967), 8-th internat. Confer on phenomena in ionized gases. Vienna Austria, p.187. 150 Rickerby D. S., Jones A. M. and Bellamy B. A. (1989), surface and coating technologys 37, 111. 151 Roquiny P., Mathot G., Tewagne G., Bodart F., and Van Den Brande P. (2000), Nuclear Instruments & Methods in Physics Research, Section B 161-163, 600. 152 Rothenberger, G., Moser, J., Gratzel, M., Serpone, N. and Sharma D. K., (1985) “Charge carrier trapping and recombination dynamics in small semiconductor particles,” Journal of the American Chemical Society Vol. 107, pp. 8054-8059. 153 Roy Morrison S. (1997), The Chemical Physics of surfaces, P. 313. 154 Sarkar A., Ghosh S., Chadhuri S., and Pal A. K. (1991), Thin Solid Fillms 204 (1), 255-264. 155 Sato H., Minami T., Takata S., Mouri T., and Ogawa N. (1992), Thin Solid Films 220, 327-332. 156 Sato H., Minami T., Takata S., Mouri T., and Ogawa N. (1994), Thin Solid Films 246 (1-2), 86-91. 157 Schmid P.E., Sunaga M.S., Levy F. (1998), J. Vac. Sci. Technol. A 16(5), 2870. 158 Shenhar A., Gotman I., Radin S., Ducheyne P., and Gutmanas E.Y. (2000), Surface and Coating Tech. 126, 210. 158 159 Shimizu Y. and Egashira M. (1999), Materials Research Society Bulletin 24 (6), 18-24. 160 Shirakawa H., Komiyama H. (1999), J. Nanoparticle Research 1, 17. 161 Shuichi Kanamori (1986), Thin Solid Films 136, 195-214 162 Smith D. M. (1995), Thin-Film Deposition , McGraw-Hill, Inc., New York. 163 Smith G.B., Swift P.D., Bendavid A. (1999), Applied Physics Letters 75 (5), 630-632. 164 Solar Energy Material & Solar Cells 84, 159-170 (2004). 165 Srikant V., Sergo V., and Clarke D. (1995), Journal of the American Ceramic Society 78 (7), 1931-4. 166 Sundgren J.E., Johansson B.O., Karlsson S.E. and Hentzell H. T. G., (1983), Thin Solid Films 105, 367. 167 Swanepoel R. (1983), J. Phys.E. Sci. Instrum Vol. 16, P. 1214 – 1222. 168 Tarniowy A., Mania R., Rekas M., (1997), Thin Solid Films 311, 93. 169 Tepper T., Shechtman D., Van Heerden D., Hosell D. (1997), fcc titanium in titanium/ silver multilayers, Materials Letters 33, 181-184. 170 Timothy J. Coutts, David L. Young, and Xiaonan Li (2000), MRS BULLETIN/AUGUST. 171 Tominaga K., Kuroda K., and Tada O. (1988), Japanese Journal of Applied Physics 27 (7), 1176-1180. 172 Tominaga K., Murayama T., Sato Y., and Mori I. (1999), Thin Solid Films 343-344, 81-84. 173 Tominaga K., Umezu N., Mori I., Ushiro T., Moriga T., and Nakabayashi I. (1998), Thin Solid Films 334, 35-39. 174 Tominaga K., Yuasa T., Kume M., and Tada O. (1984), Japanese Journal of Applied Physics Part 1 23 (7), 936-937. 159 175 Torok E. and Perry A. J., (1987), Thin solid films 153, 37. 176 Toth L. E. (1971), Transitional metal carbides and nitrites, Academic press, Newyork. 177 Turchi C. and Ollis D. (1990), “Photocatalytic degradation of organic water contaminant: mechanisms involving hydroxyl radical attack,” Journal of Catalysis Vol. 122, pp. 178-192. 178 Vaidyanathan Subramanian, Photoelectrochemical And Photocatalytic Aspects Of Semiconductor – Metal Nanocomposites Semiconductor – Metal Nanocomposites, Degree of Doctor of Philosophy Notre Dame, Indiana April 2004. 179 Van Vlack L. H. (1990), Elements of Materials Science and Engineering, 6th ed.(Addison-Wesley, New York. 180 Venkataraj S., Kappertz O., Weis H., Dress R., Jeyavel R., and Wuttig M. (2002), "structural and optical properties on thin zirconium oxide films prepared by reactive direct current magnetron sputtering", J. Appl. Phys. 92(5), 3599 - 3607. 181 Vershinin N., Filomov K., Straumal B., Gust W., Wiener I., Rabkin E., and Kazakevich A. (2000), Surface and Coating Technol. 125, 229. 182 Vijayakumar P. S., Blaker K. A., Weiting R. D., Wong B., Halani A. T., and Park C. (1988), Patent# 4,751,149, USA. 183 Volvada V., Kuzel R., Jr., Cerny R. (1988), J. Musil thin solid films, 156, 53. 184 Von Seefeld H., Cheung N. W., Mọienpọọ M. and Nicolet M.A. (1980), IEEE Trans. Electron Devices 27, 873. 185 Wang K. W. and Seo Y. W. (1993) , J. Vac. Sci Technol. A 11, 1496. 186 Wittmer M., Studer B., and Melchiar H. (1981), J. Appl. Phys. 52, 5722. 187 Xu et al. (2006), J Zhejiang Univ SCIENCE A 7(3):472-476. 188 Yamamura Y. and Itoh N. (1989), in Ion Beam Assisted Film Growth, ed. by Itoh T., Chapter 4, Copyright Elsevier. 160 189 Yamazaki. S., Matsunaga. S. and Hori K. (2001) “Photocatalytic degradation of trichloroethylene in water using TiO2 pellets”, Water Resources Vol. 35, pp. 1022-1028. 190 Young D. L., Coutts T. J., and Kaydanov V. I, Gilmore A. S., and Mulligan W. P. (2000), Journal of Vacuum Science & Technology A 18 (6), 2978-85. 191 Young D. L., Coutts T. J., and Kaydanov V. I. (2000), Review of Scientific Instruments 71 (2), 462-6. 192 Young Eui Lee, Soo Gil Kim, Young Jil Kim and Hyeong Joon Kim (1997), J. Vac. Sci Technol A. 15(3), P.1194 – 1199. 193 Zafar S., Ferekides C. S., and Morel D. L. (1994), Proceedings of 1994 IEEE 1st World Conference on Photovoltaic Energy Conversion, Waikoloa, HI, USA. 194 Zega B., Kormann M., and Amiguet J. (1977), Thin Solid Films 54, 577. 195 Zhang D. H. and Ma H. L. (1996), Applied Physics A 62 (5), 487-92. 196 Zhang D.H., Yang T.L., Wang Q.P., Zhang D.J. (2001), Materials Chemistry and Physics 68, 233-238. 197 Zhang S. B., Wei S.-H., and Zunger A. (2001), Physical Review B 63 (7), 63-69. 198 Zhao L., Yu Y., L.. Song X, Hu X. F., Larbot A. (2005), Appl. Surf. Sci. 239, 285.